A world-first non-destructive quality control method from the National Physical Laboratory (NPL) has enabled Oxford Instruments to commercialise wafer-scale fabrication technology for 2-D material MoS2.
The demand for miniaturisation of electronics, such as smartphones, wearables and the Internet of Things devices, is continuing to grow, but the industry is now reaching the scaling limit for traditional silicon materials. Two-dimensional (2-D) materials have attracted significant interest in recent years due to their unique electrical and mechanical properties, alongside atomically-thin dimensions.
While graphene was the first 2-D material to be studied in detail, there is now also a focus on other 2-D materials with diverse properties and new applications. Among these, single-layer molybdenum disulphide (MoS2), a semiconducting 2-D material, is generating a lot of interest due to its technologically exploitable electronic and optical properties that could pave the way for the next generation of electronics and optoelectronics devices.